JPH0349627B2 - - Google Patents

Info

Publication number
JPH0349627B2
JPH0349627B2 JP56187662A JP18766281A JPH0349627B2 JP H0349627 B2 JPH0349627 B2 JP H0349627B2 JP 56187662 A JP56187662 A JP 56187662A JP 18766281 A JP18766281 A JP 18766281A JP H0349627 B2 JPH0349627 B2 JP H0349627B2
Authority
JP
Japan
Prior art keywords
coating
substrate
fluid
coating material
station
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56187662A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58137470A (ja
Inventor
Efu Botsuku Hendoritsuku
Jei Baabara Fuiritsupu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
INTEGUREITETSUDO TEKUNOROJIIZU Inc
Original Assignee
INTEGUREITETSUDO TEKUNOROJIIZU Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by INTEGUREITETSUDO TEKUNOROJIIZU Inc filed Critical INTEGUREITETSUDO TEKUNOROJIIZU Inc
Publication of JPS58137470A publication Critical patent/JPS58137470A/ja
Publication of JPH0349627B2 publication Critical patent/JPH0349627B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/28—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/02—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material to surfaces by single means not covered by groups B05C1/00 - B05C7/00, whether or not also using other means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0091—Apparatus for coating printed circuits using liquid non-metallic coating compositions
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S118/00—Coating apparatus
    • Y10S118/02—Bead coater

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
JP56187662A 1981-05-20 1981-11-20 メニスカス被覆方法 Granted JPS58137470A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US265724 1981-05-20
US06/265,724 US4370356A (en) 1981-05-20 1981-05-20 Method of meniscus coating

Publications (2)

Publication Number Publication Date
JPS58137470A JPS58137470A (ja) 1983-08-15
JPH0349627B2 true JPH0349627B2 (en]) 1991-07-30

Family

ID=23011639

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56187662A Granted JPS58137470A (ja) 1981-05-20 1981-11-20 メニスカス被覆方法

Country Status (6)

Country Link
US (1) US4370356A (en])
JP (1) JPS58137470A (en])
DE (1) DE3145879C2 (en])
FR (1) FR2506183A1 (en])
GB (1) GB2098510B (en])
NL (1) NL8105269A (en])

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011518426A (ja) * 2008-02-22 2011-06-23 マテリアルズ・アンド・テクノロジーズ・コーポレーション 片面式高スループットの湿式エッチングおよび湿式処理装置および方法
JP2013066873A (ja) * 2011-09-26 2013-04-18 Toshiba Corp 塗布装置
WO2015166566A1 (ja) * 2014-04-30 2015-11-05 株式会社エフケー光学研究所 塗布装置及び塗布方法

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US4676404A (en) * 1983-10-17 1987-06-30 Nippon Zeon Co., Ltd. Method and apparatus for feeding drug liquid from hermetic returnable can
FR2557471B1 (fr) * 1983-12-29 1986-05-09 Lancesseur Bernard Capsule absorbante et notamment deshydratante
DE3429335C1 (de) * 1984-08-09 1986-02-13 Billhöfer Maschinenfabrik GmbH, 8500 Nürnberg Verfahren und Vorrichtung zum Lackieren unebener Platten
JPS63182074A (ja) * 1987-01-21 1988-07-27 Nippon Sheet Glass Co Ltd 有限長の板体の片側表面に有機珪素含有溶液を塗布する方法
JP2565406B2 (ja) * 1988-12-26 1996-12-18 富士写真フイルム株式会社 塗布装置及びカラーフィルターの製造方法
EP0376207A3 (en) * 1988-12-26 1991-07-03 Fuji Photo Film Co., Ltd. Application device
US5238523A (en) * 1989-04-21 1993-08-24 Idemitsu Kosan Co., Ltd. Apparatus for producing a liquid crystal optical device
DE69020634T2 (de) * 1989-04-21 1996-04-04 Idemitsu Kosan Co Herstellungsverfahren für ein mit einem Film aus flüssigkristallinem Material überzogenes Substrat sowie Verfahren und Gerät zur Herstellung einer optischen Vorrichtung mit einem Flüssigkristall.
DE4021621A1 (de) * 1989-07-13 1991-01-24 Hamatech Gmbh Verfahren und vorrichtung zur belackung einer oberflaeche mit schutzlack oder fotolack
US5455062A (en) * 1992-05-28 1995-10-03 Steag Microtech Gmbh Sternenfels Capillary device for lacquering or coating plates or disks
FR2693558B1 (fr) * 1992-07-09 1994-08-19 Commissariat Energie Atomique Procédé de fabrication de couches minces présentant des propriétés optiques.
US5336575A (en) * 1992-11-03 1994-08-09 Zenith Electronics Corporation Method of producing CRT screens using meniscus coating
US5556665A (en) * 1992-11-03 1996-09-17 Zenith Electronics Corporation Meniscus coating of CRT screens
US5339842A (en) * 1992-12-18 1994-08-23 Specialty Coating Systems, Inc. Methods and apparatus for cleaning objects
US5270079A (en) * 1992-12-18 1993-12-14 Specialty Coatings Systems, Inc. Methods of meniscus coating
WO1994025177A1 (de) * 1993-05-05 1994-11-10 Steag Micro-Tech Gmbh Sternenfels Vorrichtung zur belackung oder beschichtung von platten oder scheiben
US5650196A (en) * 1993-05-05 1997-07-22 Steag Microtech Gmbh Device for coating substrates in semiconductor production
WO1995005901A1 (de) * 1993-08-26 1995-03-02 Steag Micro-Tech Gmbh Sternenfels Vorrichtung zur belackung von substraten in der halbleiterfertigung
DE69427954T2 (de) * 1993-05-27 2002-04-04 Dai Nippon Printing Co., Ltd. Verfahren und vorrichtung zum flüssigkeitsauftrag
US5368645A (en) * 1993-09-24 1994-11-29 Specialty Coating Systems Inc. Vacuum chuck for coating apparatus
US5895542A (en) * 1994-11-23 1999-04-20 Appleton Papers Incorporated Coater and a method for coating a substrate
US5545440A (en) * 1994-12-05 1996-08-13 At&T Global Information Solutions Company (Aka Ncr Corporation) Method and apparatus for polymer coating of substrates
US5601655A (en) * 1995-02-14 1997-02-11 Bok; Hendrik F. Method of cleaning substrates
US5935653A (en) * 1996-01-18 1999-08-10 Micron Technology, Inc. Methods for coating a substrate
US5762773A (en) 1996-01-19 1998-06-09 Micron Display Technology, Inc. Method and system for manufacture of field emission display
US5900273A (en) * 1996-01-19 1999-05-04 Micron Technology, Inc. Method for coating a substrate covered with a plurality of spacer members
US6117294A (en) 1996-01-19 2000-09-12 Micron Technology, Inc. Black matrix material and methods related thereto
US5858459A (en) * 1996-02-22 1999-01-12 Micron Technology, Inc. Cassette invertor apparatus and method
US5695833A (en) * 1996-06-12 1997-12-09 Bok; Hendrik F. Method for uniform film coating of substrates
DE19632844C1 (de) * 1996-08-14 1997-11-06 Greisel Baustoff Gmbh Verfahren und Vorrichtung zum Aufbringen von Mörtel auf die Unterseite eines Bausteins
DE60044762D1 (de) * 1999-05-20 2010-09-16 Kaneka Corp Verfahren und Vorrichtung zur Herstellung eines Halbleiterbauelements
US7122126B1 (en) * 2000-09-28 2006-10-17 Materials And Technologies Corporation Wet processing using a fluid meniscus, apparatus and method
US6528117B2 (en) * 2001-01-19 2003-03-04 Paul Lewis Method for coating a substance on one side of a substrate using a single miniscus
DE10139923A1 (de) * 2001-08-14 2003-03-06 Inductotherm Coating Equipment Verfahren und Vorrichtung zum schmelzflüssigen Beschichten
US20040045578A1 (en) * 2002-05-03 2004-03-11 Jackson David P. Method and apparatus for selective treatment of a precision substrate surface
US20040023367A1 (en) * 2002-07-31 2004-02-05 Affymetrix, Inc. Method of photolithographic production of polymer arrays
US7147721B2 (en) * 2002-12-30 2006-12-12 Asm Assembly Automation Ltd. Apparatus and method for cleaning electronic packages
US8127395B2 (en) * 2006-05-05 2012-03-06 Lam Research Corporation Apparatus for isolated bevel edge clean and method for using the same
DE102007033226A1 (de) 2007-07-17 2009-01-22 Kosub, Johann Aerodynamisches Schleuderverfahren zum Auftragen von flüssigen Schichten
EP2882540B1 (en) 2012-08-09 2017-12-27 DSM IP Assets B.V. Roll coating process
US8960123B2 (en) * 2013-02-08 2015-02-24 Enki Technology, Inc. Coating and curing apparatus and methods
JP5978337B1 (ja) * 2015-03-16 2016-08-24 株式会社東芝 塗布装置、塗布方法及び塗布プログラム
JP6239548B2 (ja) 2015-03-18 2017-11-29 株式会社東芝 塗布装置及び塗布方法
DE102016210883A1 (de) 2016-06-17 2017-12-21 Singulus Technologies Ag Vorrichtung und Verfahren zur Behandlung von Substraten unter Verwendung einer Auflagerolle mit porösem Material
PL234389B1 (pl) * 2017-12-04 2020-02-28 Akademia Gorniczo Hutnicza Im Stanislawa Staszica W Krakowie Urządzenie i sposób prowadzenia reakcji fotochemicznej w przesuwanym menisku

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US1289507A (en) * 1917-12-06 1918-12-31 Barrett Co Method and apparatus for treating coated roofing materials.
US2541479A (en) * 1945-10-06 1951-02-13 Eastman Kodak Co Method and apparatus for coating photographic film
BE555735A (en]) * 1956-03-12
GB858118A (en) * 1956-07-06 1961-01-04 Ilford Ltd Improvements in or relating to coating processes
US3294576A (en) * 1963-01-14 1966-12-27 First Safe Deposit Nat Bank Of Method of producing printed circuit structures
US3429741A (en) * 1965-06-11 1969-02-25 Eastman Kodak Co Method of coating using a bead coater
US3367791A (en) * 1966-07-11 1968-02-06 Addressograph Multigraph Liquid development of electrostatic images
US3589975A (en) * 1967-03-23 1971-06-29 Reynolds Metals Co Composite sheet of plastic and metallic material and method of making the same
US3473955A (en) * 1967-05-05 1969-10-21 Eastman Kodak Co Coating process
US3535157A (en) * 1967-12-18 1970-10-20 Shipley Co Method of coating printed circuit board having through-holes
GB1246749A (en) * 1968-08-22 1971-09-15 Asahi Glass Co Ltd Method of and apparatus for coating glass surfaces
US4004045A (en) * 1974-08-09 1977-01-18 Stelter Manfred K Method for fluid film application
US4055144A (en) * 1976-03-15 1977-10-25 Polychrome Corporation Apparatus for meniscus coating of a moving web
US4082868A (en) * 1976-03-18 1978-04-04 Armco Steel Corporation Method for continuously contact-coating one side only of a ferrous base metal strip with a molten coating metal
US4154193A (en) * 1976-11-16 1979-05-15 Tokyo Shibaura Electric Co., Ltd. Glass frit mixture coating apparatus
JPS5567359A (en) * 1978-11-16 1980-05-21 Matsushita Electric Ind Co Ltd Method and apparatus for coating
DE3041721A1 (de) * 1980-11-05 1982-06-09 Agfa-Gevaert Ag, 5090 Leverkusen Vorrichtung zum auftragen von mindestens einer schicht auf eine oberflaeche eines gutes

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011518426A (ja) * 2008-02-22 2011-06-23 マテリアルズ・アンド・テクノロジーズ・コーポレーション 片面式高スループットの湿式エッチングおよび湿式処理装置および方法
JP2013066873A (ja) * 2011-09-26 2013-04-18 Toshiba Corp 塗布装置
WO2015166566A1 (ja) * 2014-04-30 2015-11-05 株式会社エフケー光学研究所 塗布装置及び塗布方法

Also Published As

Publication number Publication date
NL8105269A (nl) 1982-12-16
GB2098510B (en) 1985-02-27
US4370356A (en) 1983-01-25
DE3145879A1 (de) 1982-12-16
GB2098510A (en) 1982-11-24
FR2506183A1 (fr) 1982-11-26
JPS58137470A (ja) 1983-08-15
DE3145879C2 (de) 1985-03-28

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